Introduction of Titanium Silicide TiSi2 Pulver
Titanium disilicide
TiSi2 (the chemical formula) is an inorganic compound made of titanium and silica. It is a dark-gray square crystal which can also be powdered and used to make target materials. It’s a silica metal. These raw materials include titanium and the silicon metals. It exhibits high conductivity, high temperature stability and excellent electrical properties.
Titanium silicicide TiSi2 powder: Physicochemical properties
Among metal silicides like TiSi2, NiSi or CoSi2, WSi2, TaSi2, MoSi2 and MoSi2, titanium silicide stands out. This silicide offers excellent properties, including good electrical conductivity, selectivity, thermal stability and good process adaptability.
Other Elements
Si: What does it mean?
Si (atomic symbol Si; atomic number fourteen) is an element in the Period P group 14, with an atomic Mass of 28.855. Silicium, which is second after oxygen in terms of its weight, makes up 25.7 per cent of the Earth’s crust. The metals are rarely found in their pure form. Instead, they are made from an iron/silicon alloy known as ferrosilicon. Glass’ main constituent is Element Silicon, also known as silicon dioxide. This is a cheap material with great mechanical, optical and thermal properties. You can make ultra-pure silica by adding boron or gallium, phosphorus or arsenic. Silicon is then used in rectifiers and transistors as well other solid state devices that are widely used in electronic industry.
How does Ti work?
With an atomic weight of 47.867, Titanium, also known as Ti (atomic symbol 22 and atomic numer 22), is a 4th-period group D element. The basic form of titanium is silver-gray with a white metallic look. Titanium can be chemically and physically identical to zirconium. This is because it has the same amount of valence electronics as titanium and falls under the same group on the periodic table. You can find five isotopes naturally: 46Ti-50Ti and 48Ti. The most common (73.8%) being titanium. It is also found in sedimentary rocks.
Titanium Silicide TiSi2 Pulver Production Methods
By reacting titanium or titanium hydroide with silicon, you can create titanium disilicide.
Ti + Ti 2Si = TiSi2
This can be done by sulfur, aluminum, silicon dioxide and titanium dioxide.
A second method involves reacting titanium tetrachloride and silane, diclosilane, silicon.
TiCl4 + 2SiH4 – TiSi2 + 4HCl + 2H2
TiCl4 + 2SiH2Cl2 + 2H2 – TiS2 + 8HCl
TiCl4 + 3Si – TiSi2 + SiCl4
Titanium Silicide TiSi2 Pulp
In the semiconductor industry, titanium silicide is commonly used. This silicide is typically grown on silicon wires and polysilicon wires with self-aligning silicide technology. It reduces the thickness resistance of local transistor connections. This is a common use in the C54 phase of microelectronics.
The source, gate, leak contacts and interconnections of CMOS integrated Circuits are all made from titanium silicide. These applications require that titanium silicide have a low resistivity of 20mo -cm and not agglomerate under high-temperature treatments. For electronic applications, the Ti/Si system contains two silica stages: C49 TiSi2 with high resistivity (60-70mo-cm), formed at 600-700 degrees Celsius and C54 TiSi2 which is formed at 700-850 degree Celsius.
Titanium siicide TiSi2 Pulver is main supplier
Nano Technology Co. Ltd., an international supplier of high quality chemicals, is trusted to provide Nanomaterials and super-high-quality chemicals.
High-quality products are what you want titanium silicide TiSi2 powder Please feel free and contact us to send an enquiry. (brad@ihpa.net)
Titanium silicicide TiSi2 powder: Physicochemical properties
Among metal silicides like TiSi2, NiSi or CoSi2, WSi2, TaSi2, MoSi2 and MoSi2, titanium silicide stands out. This silicide offers excellent properties, including good electrical conductivity, selectivity, thermal stability and good process adaptability.
| TiSi2 Titanium Powder Properties | |
| Additional Names | TiSi2 Powder, titanium disilicide |
| CAS No. | 12039-83-7 |
| Formula compound | TiSi2 |
| Molecular Weight | 104.04 |
| Appearance | black powder |
| Melting Point | 1470 degC |
| Boiling Point | N/A |
| Density | 4.02g/cm3 |
| Solubility of H2O | N/A |
| Get the exact Mass | 103.9018 |
Titanium Silicide TISi2 Powder, CAS 12039–83-7
Other Elements
Si: What does it mean?
Si (atomic symbol Si; atomic number fourteen) is an element in the Period P group 14, with an atomic Mass of 28.855. Silicium, which is second after oxygen in terms of its weight, makes up 25.7 per cent of the Earth’s crust. The metals are rarely found in their pure form. Instead, they are made from an iron/silicon alloy known as ferrosilicon. Glass’ main constituent is Element Silicon, also known as silicon dioxide. This is a cheap material with great mechanical, optical and thermal properties. You can make ultra-pure silica by adding boron or gallium, phosphorus or arsenic. Silicon is then used in rectifiers and transistors as well other solid state devices that are widely used in electronic industry.
How does Ti work?
With an atomic weight of 47.867, Titanium, also known as Ti (atomic symbol 22 and atomic numer 22), is a 4th-period group D element. The basic form of titanium is silver-gray with a white metallic look. Titanium can be chemically and physically identical to zirconium. This is because it has the same amount of valence electronics as titanium and falls under the same group on the periodic table. You can find five isotopes naturally: 46Ti-50Ti and 48Ti. The most common (73.8%) being titanium. It is also found in sedimentary rocks.
Titanium Silicide TiSi2 Pulver Production Methods
By reacting titanium or titanium hydroide with silicon, you can create titanium disilicide.
Ti + Ti 2Si = TiSi2
This can be done by sulfur, aluminum, silicon dioxide and titanium dioxide.
A second method involves reacting titanium tetrachloride and silane, diclosilane, silicon.
TiCl4 + 2SiH4 – TiSi2 + 4HCl + 2H2
TiCl4 + 2SiH2Cl2 + 2H2 – TiS2 + 8HCl
TiCl4 + 3Si – TiSi2 + SiCl4
Titanium Silicide TiSi2 Pulp
In the semiconductor industry, titanium silicide is commonly used. This silicide is typically grown on silicon wires and polysilicon wires with self-aligning silicide technology. It reduces the thickness resistance of local transistor connections. This is a common use in the C54 phase of microelectronics.
The source, gate, leak contacts and interconnections of CMOS integrated Circuits are all made from titanium silicide. These applications require that titanium silicide have a low resistivity of 20mo -cm and not agglomerate under high-temperature treatments. For electronic applications, the Ti/Si system contains two silica stages: C49 TiSi2 with high resistivity (60-70mo-cm), formed at 600-700 degrees Celsius and C54 TiSi2 which is formed at 700-850 degree Celsius.
Titanium siicide TiSi2 Pulver is main supplier
Nano Technology Co. Ltd., an international supplier of high quality chemicals, is trusted to provide Nanomaterials and super-high-quality chemicals.
High-quality products are what you want titanium silicide TiSi2 powder Please feel free and contact us to send an enquiry. (brad@ihpa.net)
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