High Purity Tungsten Silicide WSi2 Powder CAS 12039-88-2, 99% | Lemondedudroit

About Tungsten Silicide WSi2 Powder :
Tungsten silicide (WSi2) This inorganic compound is a silicide for tungsten. It is a conductive material. Tungsten silicide It reacts aggressively to strong acids and fluorine as well as oxidants, halogens, and oxidants. WSi2 Anti-oxidation coatings perform well in any application. The high emissivity makes it similar to MoSi2, the molybdenum disilicide MoSi2. tungsten disilicide It is suitable for radiant cooling high temperatures, and it has the definition of a heatshield.

Silicide This material is commonly used in microelectronics. It has a resistance of 60-80mOcm and forms 1000°C. To increase the conductivity and signal speed of polysiliconwires, it is often used as a shunt. You can prepare the silicide layers by chemical vapor dipping, which uses monosilane or Dichlorosilane as the source gas. Non-stoichiometric film must be annealed to transform to a more stoichiometric result. Tungsten silicide This film can be used as a replacement for early tungsten film. Tungsten silicide powder can also be used in microelectromechanical systems and oxidation-resistant coatings.

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Tungsten Silicide Powder WSi2 Powder Characteristics:
Tungsten silicide, WSi2 powder (CAS 120339-88-2), has a high melting temperature, high corrosion resistance and high oxidation resistant. It is also good for electrical applications.
High-temperature ductility, conductivity and the binary alloy system is the intermediate phase.

Tungsten Silicide Powder WSi2 Powder Technical Parameter:

Product name	MF	Purity	Particle size	Melting Point	Density	The color of the sky
tungsten silicide	WSi2	99%	5-10um	2165	9.4 g/cm3	Black

Tungsten Silicide Powder Chemical Composition:

WSi2	W	Si	C	P	Fe	S
>99%	>76.1%	Balance	0.01%	0.02%	0.20%	0.004%

What are the steps involved in producing Tungsten Siicide WSi2 powder?
For synthetic silicide, tungsten pulverized powder, silicon powder and tungsten powder are the raw materials. In acetone, they last an average of 24 hours. While the powder 5: 1 is the starting powder, it is used for the measurement of thermometric measurements. Dried substances, and acetone evaporation. Heat treatment was performed at various temperatures from 50°C to 1250°C and 1400°C. Heat treatment took place in an argon flow furnace for 4 hours. Once the heat treatment has ended, the furnace should be brought to room temperature.

Tungsten Silicide Powder WSi2 Powder :
Tungsten silicide, WSi2 powder, is used in microelectronics to provide an electric shock, as well as shunting for polysilicon wires. Tungsten silicide (WSi2 powder) is used as contact material in microelectronics. It has a resistivity range of 60-60mOcm. The product is produced at 1000°C. Tungsten silicide can be used as a shunt to improve the conductivity and signal speed of polysilicon line. You can make the layer of tungsten silicide by using chemical vapor dilution, like vapor evaporation. You can use monosilane/dichlorosilane as a raw material gas, or tungstenhexafluoride. For a more conductive form, the film should be annealed.
Tungsten silicide may replace early tungsten films. Tungsten silicide may also be used as a barrier to other metals and silicon.
Tungsten silicide is also very valuable in micro-electromechanical systems, in which tungsten silicide is mainly used as a thin film for the manufacture of microcircuits. Plasma-etching tungsten silicide using silicide is possible for this purpose.

Packing & Shipping Tungsten Siicide WSi2 Pulver:
There are many options for packing, which all depend on how large the amount of tungsten silicide (WSi2) powder is.
Tungsten silicide WSi2 powder packing: You can vacuum pack 1kg/bag, 25kg/barrel or according to your requirements.
Tungsten silicide WSi2 powder shipping: You can have your order shipped by sea or air as soon as you receive payment.


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